We provide electronic material solutions through advanced materials and precision engineering.
ARC® is an anti-reflective coating used in the photolithography process of semiconductor manufacturing. By coating the layer beneath the photoresist, it resolves critical technical challenges encountered during the exposure process.
NCK Co., Ltd. and Nissan Chemical Corporation drive semiconductor innovation by providing a comprehensive range of products—spanning from i-line ARC® materials to high-performance underlayers for state-of-the-art EUV (Extreme Ultraviolet) lithography.
Currently, we are expanding our business portfolio beyond ARC® to include multilayer process materials and temporary bonding materials. To keep pace with the ongoing evolution toward semiconductor miniaturization and high integration, we remain committed to developing and consistently delivering essential materials that are indispensable to the semiconductor manufacturing process.
*ARC® is a registered trademark of Brewer Science, Inc.
